JPH0456842B2 - - Google Patents

Info

Publication number
JPH0456842B2
JPH0456842B2 JP60003070A JP307085A JPH0456842B2 JP H0456842 B2 JPH0456842 B2 JP H0456842B2 JP 60003070 A JP60003070 A JP 60003070A JP 307085 A JP307085 A JP 307085A JP H0456842 B2 JPH0456842 B2 JP H0456842B2
Authority
JP
Japan
Prior art keywords
parts
resin
composition
energy ray
resin particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60003070A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61162501A (ja
Inventor
Kazunori Kanda
Ryuzo Mizuguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Priority to JP60003070A priority Critical patent/JPS61162501A/ja
Priority to AU51804/86A priority patent/AU574549B2/en
Priority to CA000499175A priority patent/CA1272541A/en
Priority to DE8686100235T priority patent/DE3675950D1/de
Priority to EP86100235A priority patent/EP0188232B1/en
Publication of JPS61162501A publication Critical patent/JPS61162501A/ja
Priority to US07/283,716 priority patent/US4937173A/en
Publication of JPH0456842B2 publication Critical patent/JPH0456842B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
JP60003070A 1985-01-10 1985-01-10 高エネルギ−線硬化樹脂組成物 Granted JPS61162501A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP60003070A JPS61162501A (ja) 1985-01-10 1985-01-10 高エネルギ−線硬化樹脂組成物
AU51804/86A AU574549B2 (en) 1985-01-10 1986-01-02 Radiation curable resin containing polymer microparticles
CA000499175A CA1272541A (en) 1985-01-10 1986-01-08 Radiation curable liquid resin composition
DE8686100235T DE3675950D1 (de) 1985-01-10 1986-01-09 Strahlungshaertbare fluessige kunststoffzusammensetzung.
EP86100235A EP0188232B1 (en) 1985-01-10 1986-01-09 Radiation curable liquid resin composition
US07/283,716 US4937173A (en) 1985-01-10 1988-12-13 Radiation curable liquid resin composition containing microparticles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60003070A JPS61162501A (ja) 1985-01-10 1985-01-10 高エネルギ−線硬化樹脂組成物

Publications (2)

Publication Number Publication Date
JPS61162501A JPS61162501A (ja) 1986-07-23
JPH0456842B2 true JPH0456842B2 (en]) 1992-09-09

Family

ID=11547071

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60003070A Granted JPS61162501A (ja) 1985-01-10 1985-01-10 高エネルギ−線硬化樹脂組成物

Country Status (6)

Country Link
US (1) US4937173A (en])
EP (1) EP0188232B1 (en])
JP (1) JPS61162501A (en])
AU (1) AU574549B2 (en])
CA (1) CA1272541A (en])
DE (1) DE3675950D1 (en])

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0746224B2 (ja) * 1986-06-27 1995-05-17 日本ペイント株式会社 感光性フレキソ印刷版
US5075192A (en) * 1988-08-30 1991-12-24 E. I. Du Pont De Nemours And Company Aqueous processible photosensitive compositions containing core shell microgels
US5002855A (en) * 1989-04-21 1991-03-26 E. I. Du Pont De Nemours And Company Solid imaging method using multiphasic photohardenable compositions
US4942060A (en) * 1989-04-21 1990-07-17 E. I. Du Pont De Nemours And Company Solid imaging method utilizing photohardenable compositions of self limiting thickness by phase separation
US4942066A (en) * 1989-04-21 1990-07-17 E. I. Du Pont De Nemours And Company Solid imaging method using photohardenable materials of self limiting thickness
CA2045708A1 (en) * 1990-06-27 1991-12-28 Allan S. Wilen Microwaveable packaging compositions
EP0499435A3 (en) * 1991-02-12 1993-06-30 Mitsui Petrochemical Industries, Ltd. Photo-curable resin composition
JPH04274428A (ja) * 1991-03-01 1992-09-30 Nippon Paint Co Ltd オフセット印刷用感光性組成物
US5719247A (en) * 1991-12-17 1998-02-17 Minnesota Mining And Manufacturing Company Tack-free elastomeric acrylate microspheres
EP0805837B1 (en) * 1995-01-24 1998-12-23 Nippon Paint Co., Ltd. Curable resin composition, coating composition and method for forming coated film
US5811220A (en) * 1996-10-10 1998-09-22 Polaroid Corporation On-press lithographic development methodology facilitated by the use of a disperse hydrophilic microgel
US6579917B1 (en) * 1999-02-24 2003-06-17 Sanyo Electric Co., Ltd. Surface treatment agent for model
JP4307636B2 (ja) * 1999-07-13 2009-08-05 ナブテスコ株式会社 光学的立体造形用の光硬化性樹脂組成物
US7464016B2 (en) * 2001-11-09 2008-12-09 Sun Microsystems, Inc. Hot plug and hot pull system simulation
US7231338B2 (en) * 2001-11-09 2007-06-12 Sun Microsystems, Inc. Distributed simulation system having phases of a timestep
US20030093254A1 (en) * 2001-11-09 2003-05-15 Frankel Carl B. Distributed simulation system which is agnostic to internal node configuration
US7020722B2 (en) 2001-11-09 2006-03-28 Sun Microsystems, Inc. Synchronization of distributed simulation nodes by keeping timestep schedulers in lockstep
US20030093253A1 (en) * 2001-11-09 2003-05-15 Freyensee James P. Grammar for message passing in a distributed simulation environment
US20030093256A1 (en) * 2001-11-09 2003-05-15 Carl Cavanagh Verification simulator agnosticity
US7529653B2 (en) 2001-11-09 2009-05-05 Sun Microsystems, Inc. Message packet logging in a distributed simulation system
EP1371700A3 (en) * 2002-06-14 2004-01-21 Rohm And Haas Company Curable fluids for forming coatings and adhesives
US20040131970A1 (en) * 2003-01-07 2004-07-08 Meagley Robert P. Photodefinable polymers for semiconductor applications
FR2857668B1 (fr) * 2003-07-16 2006-01-13 Commissariat Energie Atomique Composition photopolymerisable a base d'une resine expoxyvinylester et d'une resine urethane acrylate et utilisation de ladite composition pour realiser des preformes et/ou des maquettes de protheses dentaires.
US7268172B2 (en) 2004-10-15 2007-09-11 Bayer Materialscience Llc Radiation curable compositions
US7424416B1 (en) 2004-11-09 2008-09-09 Sun Microsystems, Inc. Interfacing hardware emulation to distributed simulation environments
US7480609B1 (en) 2005-01-31 2009-01-20 Sun Microsystems, Inc. Applying distributed simulation techniques to hardware emulation
US8481247B2 (en) * 2006-08-28 2013-07-09 Nissan Chemical Industries, Ltd. Resist underlayer film forming composition containing liquid additive
US20090176907A1 (en) 2008-01-08 2009-07-09 Ramesh Subramanian Direct-to-metal radiation curable compositions
WO2010082482A1 (ja) 2009-01-15 2010-07-22 株式会社カネカ 硬化性組成物、その硬化物、及びその製造方法
JP5798038B2 (ja) * 2009-10-28 2015-10-21 株式会社カネカ 光硬化性塗料組成物、及びそれを硬化させてなる塗膜
CN102906206B (zh) 2010-05-21 2016-06-22 湛新Ip有限公司 低光泽度的可辐射固化的组合物
US9752025B2 (en) * 2012-11-06 2017-09-05 Ppg Industries Ohio, Inc. Polymerizable compositions and optical articles prepared therefrom

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE603930A (en]) * 1960-05-19
AU5460180A (en) * 1975-05-07 1980-04-17 Dennison Manufacturing Company Radiation curable ethylerically unsaturated prepolymers
US4522910A (en) * 1975-06-19 1985-06-11 Napp Systems (Usa), Inc. Photosensitive graphic arts article
JPS5260702A (en) * 1975-10-22 1977-05-19 Grace W R & Co Tanning product containing hydrolyzed polyvinyl acetate
US4186069A (en) * 1978-01-30 1980-01-29 Richardson Graphics Company Photopolymerizable latex systems
US4276366A (en) * 1978-10-11 1981-06-30 E. I. Du Pont De Nemours And Company Process of using positive and negative working imaging systems from photoactive plastisols
EP0014515B2 (en) * 1979-02-01 1991-03-13 Dentsply International, Inc. Hardenable compositions, process to make a shaped article therefrom and dental appliance comprising it
US4362808A (en) * 1979-07-25 1982-12-07 Armstrong World Industries, Inc. Print screen stencil and its production
BR8103183A (pt) * 1980-05-27 1982-02-09 Du Pont Camada foto-sensivel fina;elemento foto-resistor;substrato com uma camada foto-sensivel fina laminada;e processo para aparacao de camada foto-sensivel e de um material polimerico fino
US4517177A (en) * 1980-12-17 1985-05-14 National Research Development Corporation Method of combatting plant diseases
US4415649A (en) * 1981-02-25 1983-11-15 E. I. Du Pont De Nemours & Co. Flexographic printing plates containing blended adhesives
JPS589146A (ja) * 1981-07-09 1983-01-19 Nippon Paint Co Ltd 水不要平版用版材
DE3135113A1 (de) * 1981-09-04 1983-03-24 Bayer Ag, 5090 Leverkusen Photopolymerisierbare massen, deren verwendung fuer zahnaerztliche zwecke, sowie verfahren zur herstellung von zahnersatzteilen, zahnfuellungen und ueberzuegen
US4550073A (en) * 1982-04-22 1985-10-29 E. I. Du Pont De Nemours And Company Overcoated photohardenable element having surface protuberances
US4414278A (en) * 1982-04-22 1983-11-08 E. I. Du Pont De Nemours And Company Crosslinked triacrylate polymer beads
EP0092783B1 (en) * 1982-04-22 1987-11-11 E.I. Du Pont De Nemours And Company Photosensitive coatings containing crosslinked beads
US4551415A (en) * 1982-04-22 1985-11-05 E. I. Du Pont De Nemours And Company Photosensitive coatings containing crosslinked beads
US4518472A (en) * 1982-09-10 1985-05-21 Mitsubishi Rayon Company Ltd. Delustering coating composition excellent in abrasion resistance
US4721735A (en) * 1986-01-23 1988-01-26 Dentsply Research And Development Corporation Frangible light cured compositions

Also Published As

Publication number Publication date
JPS61162501A (ja) 1986-07-23
EP0188232B1 (en) 1990-12-05
AU5180486A (en) 1986-07-17
DE3675950D1 (de) 1991-01-17
EP0188232A2 (en) 1986-07-23
EP0188232A3 (en) 1988-02-03
US4937173A (en) 1990-06-26
AU574549B2 (en) 1988-07-07
CA1272541A (en) 1990-08-07

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